PLAINVIEW, N.Y., Feb. 10, 2022 (GLOBE NEWSWIRE) -- Veeco Instruments Inc. (NASDAQ: VECO) today announced that a mask blank supplier to the semiconductor industry has ordered Veeco’s IBD-LDD® Ion Beam ...

ZEISS Semiconductor Manufacturing Technology (SMT) continues to deploying its new AIMS® EUV 3.0 systems globally at major ...

TOKYO, Sept. 09, 2025 (GLOBE NEWSWIRE) -- Leading semiconductor test equipment supplier Advantest Corporation (TSE: 6857) today announced the release of its next-generation CD-SEM* E3660, engineered ...

The fiscal second quarter saw robust growth in IT revenue and margins on EUV mask blank and HDD substrate demand, while Life Care profits declined due to increased promotional spending. The outlook ...

A new technical paper titled “Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types” was published by Hanyang University and Paul Scherrer ...

EUV Tech (EUVT), a global leader in manufacturing at-wavelength EUV metrology equipment, is excited to announce the next generation of EUV zoneplate microscopy. The AIRES ® (Actinic Image REview ...

Globalfoundries has improved its extreme ultraviolet (EUV) mask yield rate to nearly 65 percent and made progress in its movement to EUV lithography. Company CTO Gary Patton told the assembled throngs ...

Although Hoya is widely known as an eyeglass lens and contact lens provider, it has more than 60% market share in mask blanks for semiconductor manufacturing, and an even higher market share, at more ...

The eBeam Initiative conducted its 14 th annual eBeam Initiative Luminaries survey in July and reported the results on September 23, 2025 to more than 200 attendees at its annual meeting during the ...

Extreme ultraviolet lithography (EUVL) has emerged as a cornerstone technology in the semiconductor industry, enabling the production of devices with sub-10 nm feature sizes. By utilising a 13.5 nm ...